MEMS ACCELEROMETER AND MANUFACTURING METHOD THEREOF

In order to form a distance between MEMS electrodes to be d or lower, by using a process of manufacturing an MEMS structure, whose minimum line width is limited to d, at a silicon foundry, the present invention may provide an MEMS accelerometer comprising: a proof mass floating and moving in the hor...

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Bibliographic Details
Main Authors LEE, Sungdan, LEE, Sangchul, KOH, Yul, KANG, Byeonggeun
Format Patent
LanguageEnglish
French
Korean
Published 23.04.2020
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Summary:In order to form a distance between MEMS electrodes to be d or lower, by using a process of manufacturing an MEMS structure, whose minimum line width is limited to d, at a silicon foundry, the present invention may provide an MEMS accelerometer comprising: a proof mass floating and moving in the horizontal direction, and including a plurality of first electrodes extending by a predetermined length in a direction perpendicular to the moving direction; a first elastic body for elastically supporting opposite ends of the proof mass; a fixed electrode including a plurality of second electrodes extending by a predetermined length toward the proof mass; and a movable electrode disposed between the proof mass and the fixed electrode and including third electrodes disposed to overlap the first electrodes and the second electrodes positioned in opposite sides thereof, respectively, wherein the movable electrode floats and moves in the horizontal direction such that the third electrodes are attached to the second electrodes to reduce a distance between the first electrodes and the third electrodes. L'invention concerne, afin de former une distance entre des électrodes MEMS à d ou moins, l'utilisation d'un procédé de fabrication d'une structure MEMS, dont la largeur de ligne minimale est limitée à d, au niveau d'une fonderie de silicium, la présente invention peut fournir un accéléromètre MEMS comprenant : une masse d'épreuve flottant et se déplaçant dans la direction horizontale, et comprenant une pluralité de premières électrodes s'étendant d'une longueur prédéterminée dans une direction perpendiculaire à la direction de déplacement ; un premier corps élastique pour supporter élastiquement des extrémités opposées de la masse d'épreuve ; une électrode fixe comprenant une pluralité de secondes électrodes s'étendant d'une longueur prédéterminée vers la masse d'épreuve ; et une électrode mobile disposée entre la masse d'épreuve et l'électrode fixe et comprenant des troisièmes électrodes disposées pour chevaucher les premières électrodes et les secondes électrodes positionnées dans des côtés opposés de celle-ci, respectivement, l'électrode mobile flottant et se déplaçant dans la direction horizontale de telle sorte que les troisièmes électrodes sont fixées aux deuxièmes électrodes pour réduire une distance entre les premières électrodes et les troisièmes électrodes. 본 발명은 실리콘 파운드리에서 최소 선폭이 d로 제한된 MEMS 구조물 제작공정을 이용하여 MEMS 전극간 간격을 d 이하로 형성하기 위해, 부유되어 수평방향으로 이동하며, 이동방향에 수직방향으로 일정길이 연장되는 복수의 제1 전극을 포함하는 검증 질량, 상기 검증 질량의 양단을 탄성적으로 지지하는 제1 탄성체, 상기 검증 질량측으로 일정길이 연장되는 복수의 제2 전극을 포함하는 고정전극, 그리고, 상기 검증 질량과 상기 고정전극 사이에 구비되며, 양측에 위치하는 상기 제1 전극 및 상기 제2 전극에 각각 중첩배치되는 제3 전극을 포함하는 이동전극를 포함하며, 상기 이동전극은 상기 제3 전극이 상기 제2 전극에 부착되어 상기 제1 전극과 상기 제3 전극간 간격을 줄이도록 부유되어 수평방향으로 이동하는 것을 특징으로 하는 MEMS 가속도계를 제공할 수 있다.
Bibliography:Application Number: WO2018KR13976