FOCUSING COMPENSATION METHOD AND DEVICE

• Main Author: GUI, Yuchang
• Format: Patent
• Language: Chinese; English; French
• Published: 02.04.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Disclosed by the present invention are a focusing compensation method and device, the method comprising the following steps: (S11) providing an exposure machine lens group; (S12) providing an object to be tested, measuring a plurality of line widths of the object to be tested at a plurality of points in an axial direction of a plurality of line segments under a plurality of different focusing conditions, so as to obtain a plurality of measured values, and forming at least one line width curve according to the plurality of measured values; and (S13) correcting a focusing operation of the exposure machine lens group according to the at least one line width curve. According to the present invention, the line width of a product is measured and is fed back to an exposure machine so as to correct the focusing of the exposure machine, thereby improving the focusing precision of the exposure machine. La présente invention concerne un procédé et un dispositif de compensation de mise au point, le procédé comprenant les