ETCHING LIQUID

• Main Authors: KIMURA Yosuke, OKAZAKI Shota, OYAMA Tsubasa, KITAYAMA Hiroaki, SATO Kanji
• Format: Patent
• Language: English; French; Japanese
• Published: 05.03.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

One embodiment provides an etching liquid capable of improving the ratio of the etching speed of a silicon nitride film relative to the etching speed of a silicon oxide film. One embodiment of the present disclosure relates to an etching liquid for use in a process for removing a silicon nitride fil...