ENHANCED MOISTURIZER DEPOSITION IN CLEANSING LIQUIDS CONTAINING HYDROPHOBICALLY OR NON-HYDROPHOBICALLY MODIFIED ANIONIC POLYMERS

The invention relates to compositions comprising hydrophobically and non-hydrophobially modified cross-linked anionic polymers which have been found to minimally hinder deposition of moisturizers in compositions comprising cationic deposition polymers. L'invention concerne des compositions comp...

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Bibliographic Details
Main Authors MILLER, Jamie, DOUGHERTY, Lindsay, VASUDEVAN, Tirucherai
Format Patent
LanguageEnglish
French
Published 06.02.2020
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Summary:The invention relates to compositions comprising hydrophobically and non-hydrophobially modified cross-linked anionic polymers which have been found to minimally hinder deposition of moisturizers in compositions comprising cationic deposition polymers. L'invention concerne des compositions comprenant des polymères anioniques réticulés à modification hydrophobe et non hydrophobe qui ont été découverts pour empêcher de manière minimale le dépôt d'agents hydratants dans des compositions comprenant des polymères de dépôt cationiques.
Bibliography:Application Number: WO2019EP68536