COMPOSITION FOR HARD MASK AND PATTERN FORMING METHOD USING SAME

• Main Authors: YANG, Don Sik, CHOI, Han Young
• Format: Patent
• Language: English; French; Korean
• Published: 03.10.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

Provided is a composition for a hard mask, which comprises a copolymer containing polybenzoxazole or a precursor thereof, and a solvent. A hard mask improved in both heat resistance and etching resistance can be formed from the composition for a hard mask. L'invention concerne une composition pour masque dur, qui comprend un copolymère contenant du polybenzoxazole ou un précurseur de celui-ci, et un solvant. Un masque dur amélioré en termes de résistance à la chaleur et de résistance à la gravure peut être formé à partir de ladite composition pour masque dur. 폴리벤족사졸 또는 이의 전구체를 함유하는 공중합체 및 용매를 포함하는 하드마스크용 조성물이 제공된다. 하드마스크용 조성물로부터 내열성, 내에칭성이 동시에 향상된 하드마스크가 형성될 수 있다.