SEMICONDUCTOR COMPOUND, SEMICONDUCTOR ELEMENT HAVING SEMICONDUCTOR COMPOUND LAYER, LAYERED BODY, AND TARGET
This semiconductor compound is oxide-based and includes metal cations and oxygen, wherein hydrogen anions H- bonded to the metal cations are substituted by fluoride ions F-, and the semiconductor compound also includes fluoride ions F- bonded to 1 to 3 metal cations. L'invention concerne un com...
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | English French Japanese |
Published |
06.06.2019
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Subjects | |
Online Access | Get full text |
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Summary: | This semiconductor compound is oxide-based and includes metal cations and oxygen, wherein hydrogen anions H- bonded to the metal cations are substituted by fluoride ions F-, and the semiconductor compound also includes fluoride ions F- bonded to 1 to 3 metal cations.
L'invention concerne un composé semi-conducteur à base d'oxyde et comprenant des cations métalliques et de l'oxygène, les anions hydrogène H- liés aux cations métalliques étant remplacés par des ions fluorure F-, et le composé semi-conducteur comprenant également des ions fluorure F- liés à 1 à 3 cations métalliques.
金属カチオンおよび酸素を含む酸化物系の半導体化合物であって、前記金属カチオンと結合していた水素負イオンH-がフッ素イオンF-で置換されており、1個~3個の金属カチオンと結合しているフッ素イオンF-を有する、酸化物系の半導体化合物。 |
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Bibliography: | Application Number: WO2018JP40343 |