COMPOSITION FOR DEPOSITION OF SILICON-CONTAINING THIN FILM, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM BY USING SAME

• Main Authors: PARK, Gun-Joo, PARK, Jeong Joo, KIM, Myong Woon, JEONG, Hee Yeon, LEE, Sam Dong, LEE, Sang Ick, PARK, Joong Jin, JANG, Se Jin, KIM, Sung Gi, YANG, Byeong-il
• Format: Patent
• Language: English; French; Korean
• Published: 31.05.2019
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to: a composition for deposition of a silicon-containing thin film, comprising a trisilylamine compound; and a method for manufacturing a silicon-containing thin film by using the same and, more specifically, provides: a composition for deposition of a silicon-containing thin film, comprising a trisilylamine compound, which is capable of forming a silicon-containing thin film at a very excellent deposition rate at a low temperature, so as to be effectively usable as a precursor of a silicon-containing thin film and a display packaging material; and a method for manufacturing a silicon-containing thin film by using the same. La présente invention concerne : une composition pour déposer un film mince contenant du silicium, comprenant un composé de trisilylamine ; et un procédé de fabrication d'un film mince contenant du silicium à l'aide de celui-ci, et fournit, plus spécifiquement : une composition pour déposer un film mince contenant du silicium, comprenant un composé de trisilylamine, qui est capable de former un film mince contenant du silicium à un taux de dépôt très excellent à basse température, de façon à être efficacement utilisable en tant que précurseur d'un film mince contenant du silicium et d'un matériau d'emballage d'affichage ; et un procédé de fabrication d'un film mince contenant du silicium à l'aide de celui-ci. 본 발명은 트리실릴아민 화합물을 함유하는 실리콘 함유 박막 증착용 조성물 및 이를 이용하는 실리콘 함유 박막의 제조방법에 관한 것으로, 보다 상세하게는 저온에서 매우 우수한 증착속도로 실리콘 함유 박막을 형성할 수 있어 실리콘 함유 박막의 전구체 및 디스플레이의 봉지재로 유용하게 사용될 수 있는 트리실릴아민 화합물을 함유하는 실리콘 함유 박막 증착용 조성물 및 이를 이용하는 실리콘 함유 박막의 제조방법을 제공한다.