METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR DEVICES

A technique comprising: forming a patterned mask over an organic semiconductor layer; using the patterned mask to pattern a layer over the organic semiconductor layer; exposing the patterned mask to radiation that renders the patterned mask soluble in a solvent; and then dissolving away the patterne...

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Bibliographic Details
Main Authors VANDEKERCKHOVE, Herve, TOO, Patrick
Format Patent
LanguageEnglish
French
Published 23.05.2019
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Summary:A technique comprising: forming a patterned mask over an organic semiconductor layer; using the patterned mask to pattern a layer over the organic semiconductor layer; exposing the patterned mask to radiation that renders the patterned mask soluble in a solvent; and then dissolving away the patterned mask using the solvent. Une technique consiste à : former un masque à motifs sur une couche semi-conductrice organique ; utiliser le masque à motifs pour former une couche sur la couche semi-conductrice organique ; exposer le masque à motifs à un rayonnement qui rend le masque à motifs soluble dans un solvant ; puis dissoudre le masque à motifs à l'aide du solvant.
Bibliography:Application Number: WO2018EP80913