MULTIFUNCTIONAL PHOTO-ACID GENERATOR AND PHOTORESIST COMPOSITION COMPRISING SAME FOR THICK FILM

• Main Authors: LIM, Min Young, LEE, Tae Seob, PARK, Hyun Min
• Format: Patent
• Language: English; French; Korean
• Published: 07.03.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention relates to a photo-acid generator and a chemical amplification type photoresist composition comprising the same for a thick film, wherein the photo-acid generator has, besides effects as a photo-acid generator, remarkable solubility and sensitivity as well as an excellent anti-corrosive effect. Therefore, the chemical amplification type photoresist composition comprising the photo-acid generator for a thick film has an effect of reducing scum and/or footing on an exposure unit after development. La présente invention concerne un générateur photoacide et une composition de résine photosensible de type à amplification chimique le comprenant un film épais. Outre les effets de générateur photo-acide, le générateur photoacide possède une solubilité et une sensibilité remarquables ainsi qu'un excellent effet anticorrosion. Par conséquent, la composition de résine photosensible de type à amplification chimique comprenant le générateur photoacide pour un film épais a pour effet de réduire la crasse et/ou les résidus sur une unité d'exposition après le développement. 본 발명은 광산발생제 및 이를 포함하는 후막용 화학증폭형 포토레지스트 조성물에 관한 것으로서, 상기 광산발생제는 광산발생제로서의 효과 이외에, 용해도 및 감도가 우수하며, 뛰어난 부식방지 효과 또한 존재한다. 따라서, 상기 광산발생제를 포함하는 후막용 막용 화학증폭형 포토레지스트 조성물은 현상 후 노광부에 스컴 (scum) 및 /또는 풋팅 (footing)이 줄어드는 효과가 있다.