FILM FORMING DEVICE

• Main Authors: NAGAE, Ekishu, TAKASAKA, Yoshihiro, ENDO, Mitsuhito, AOYAMA, Takaaki
• Format: Patent
• Language: English; French; Japanese
• Published: 03.01.2019
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NOZZLES; PERFORMING OPERATIONS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

The present invention discloses a film forming device comprising: a container capable of storing a substrate therein; an exhaust mechanism capable of exhausting the inside of the container to a vacuum state; a storage mechanism that stores a solution; a nozzle capable of discharging the solution onto the substrate; and a heating mechanism capable of heating the nozzle and/or the inside of the container. This film forming device makes it possible to reduce or remove liquid traces formed during film forming on the substrate. La présente invention concerne un dispositif de formation de film comprenant : un récipient en mesure de stocker un substrat en son sein ; un mécanisme d'échappement en mesure d'évacuer l'intérieur du récipient vers un état de vide ; un mécanisme de stockage qui stocke une solution ; une buse en mesure de déverser la solution sur le substrat ; et un mécanisme de chauffage en mesure de chauffer la buse et/ou l'intérieur du récipient. Ce dispositif de formation de film permet de réduire ou d'éliminer les traces de liquide formées pendant la formation de film sur le substrat. 本発明は、内部に基板を収納可能な容器、前記容器の内部を真空状態に排気できる排気機構、溶液を貯蔵する貯蔵機構、前記溶液を前記基板に排出可能なノズル、及び前記ノズル及び/又は前記容器内部を加熱できる加熱機構と、を備える成膜装置を開示する。本発明により提供された成膜装置により、基板が成膜中に形成した液跡を減少又は除去することができる。