DISPLAY DEVICE, ARRAY SUBSTRATE, AND METHOD FOR MANUFACTURING SAME

• Main Authors: HAN, Xiao, SANG, Qi, GUO, Huibin, BAI, Jinchao, SONG, Yongzhi
• Format: Patent
• Language: Chinese; English; French
• Published: 15.11.2018
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

Provided is a method for manufacturing an array substrate. The method comprises: (S110) forming a thin film transistor and a peripheral circuit; (S120) forming a passivation layer (8) covering at least the thin film transistor and the peripheral circuit; (S130) forming a first via hole (9) penetrating the passivation layer and exposing a drain electrode (6) of a part of the thin film transistor, and a second via hole (10) penetrating the passivation layer and exposing a part of the peripheral circuit; (S140) forming on the passivation layer a pattern (11) comprising a first conductive layer, the first conductive layer covering the first via hole and the second via hole; and (S150) forming on the first conductive layer a pattern (12) comprising a reflective metal layer and a pattern (13) comprising a second conductive layer, the second conductive layer covering the second via hole. L'invention concerne un procédé de fabrication d'un substrat de matrice. Le procédé consiste : (S110) à former un transistor à cou