DISILYLAMINE COMPOUND, METHOD FOR PREPARING SAME AND SILICON-CONTAINING THIN FILM DEPOSITION COMPOSITION COMPRISING SAME

• Main Authors: PARK, Gun-Joo, LEE, Sang-Do, PARK, Jeong Joo, KIM, Myong Woon, LEE, Sam Dong, LEE, Sang Ick, JANG, Se Jin, PARK, Joong Jin, KIM, Sung Gi, YANG, Byeong-il
• Format: Patent
• Language: English; French; Korean
• Published: 25.10.2018
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a novel disilylamine compound, a method for preparing same and a silicon-containing thin film deposition composition comprising same. A disilylamine compound of the present invention shows excellent reactivity, thermal stability and high volatility and thus enables preparation of a high-quality silicon-containing thin film when used for a silicon-containing precursor. La présente invention concerne un nouveau composé disilylamine, son procédé de préparation et une composition de dépôt de film mince contenant du silicium comprenant celui-ci. Un composé disilylamine selon la présente invention présente une excellente réactivité, une stabilité thermique et une volatilité élevée et permet ainsi la préparation d'un film mince contenant du silicium de qualité élevée lorsqu'il est utilisé comme précurseur contenant du silicium. 본 발명은 신규한 다이실릴아민 화합물, 이의 제조방법 및 이를 포함하는 실리콘 함유 박막증착용 조성물에 관한 것으로, 본 발명의 다이실릴아민 화합물은 반응성이 뛰어나며 열적으로 안정하고 휘발성이 높아 실리콘 함유 전구체 사용되어 양질의 실리콘 함유 박막을 제조할 수 있다.