NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION

• Main Author: SAKURAI Takaaki
• Format: Patent
• Language: English; French; Japanese
• Published: 30.08.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

The negative photosensitive resin composition according to the present invention comprises an alkali-soluble resin, a nonionic photoacid-generating agent, and a sensitizer. La composition de résine photosensible négative selon la présente invention comprend une résine soluble dans les alcalis, un agent générateur de photoacide non ionique et un sensibilisateur. 本発明のネガ型感光性樹脂組成物は、アルカリ可溶性樹脂と、非イオン性光酸発生剤と、増感剤とを含む。