STAGE SYSTEM, LITHOGRAPHIC APPARATUS, METHOD FOR POSITIONING AND DEVICE MANUFACTURING METHOD

• Main Authors: JANSSENS, Stef, Marten, Johan, OVERSCHIE, Peter, DONDERS, Sjoerd, Nicolaas, Lambertus, TROMP, Siegfried, Alexander, SPAAN-BURKE, Theresa, Mary, SCHOLTEN, Bert, Dirk, VAN DAM, Teunis
• Format: Patent
• Language: English; French
• Published: 04.01.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention relates to a system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. In accordance with the invention, a plurality of air bearing devices is provided. Each air bea...