POLISHING PAD AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING ABRASIVE

• Main Authors: NARADA, Yousuke, KASHIWADA, Hiroshi, YAMADA, Tatsuya, KOIKE, Kenichi, TOKUSHIGE, Shin, NAKASE, Keisuke
• Format: Patent
• Language: English; French; Japanese
• Published: 07.12.2017
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; SEMICONDUCTOR DEVICES; TRANSPORTING

Provided is a polishing pad having a knit fabric configured from a warp and a weft, and a resin with which the knit fabric is impregnated, the polishing pad having a cross-section cut along the direction of the surface of the knit fabric as a polishing surface. L'invention concerne un tampon de polissage ayant un tricot conçu à partir d'une chaîne et d'une trame, et une résine avec laquelle le tricot est imprégné, le tampon de polissage ayant une section transversale découpée le long de la direction de la surface du tricot en tant que surface de polissage.. 経編又は緯編で構成された編地と、該編地に含浸された樹脂と、を有し、前記編地の面方向に切断された断面を研磨面として有する、研磨パッド。