MICRO-VOLUME DEPOSITION CHAMBER

Processing chambers having a lid with a lower surface, a substrate support with an upper surface facing the lid and an inner baffle ring between the substrate support and the lid are described. Methods of using the processing chamber are described. Cette invention concerne des chambres de traitement...

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Bibliographic Details
Main Authors JANAKIRAMAN, Karthik, CHUC, Kien N, DUBOIS, Dale R
Format Patent
LanguageEnglish
French
Published 19.10.2017
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:Processing chambers having a lid with a lower surface, a substrate support with an upper surface facing the lid and an inner baffle ring between the substrate support and the lid are described. Methods of using the processing chamber are described. Cette invention concerne des chambres de traitement comprenant un couvercle avec une surface inférieure, un support de substrat présentant une surface supérieure tournée vers le couvercle et un anneau déflecteur interne entre le support de substrat et le couvercle. L'invention concerne en outre des procédés d'utilisation de la chambre de traitement.
Bibliography:Application Number: WO2017US27395