SEMICONDUCTOR DEVICE

Provided is a semiconductor device that uses a wide-gap semiconductor, wherein a gate insulating film (7) is formed of a material that has a barrier against a minority carrier of an n-type body layer (3) and does not have a barrier against a minority carrier of a p-type drift layer (2). This makes i...

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Bibliographic Details
Main Author OYAMA Kazuhiro
Format Patent
LanguageEnglish
French
Japanese
Published 10.08.2017
Subjects
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