SEMICONDUCTOR DEVICE
Provided is a semiconductor device that uses a wide-gap semiconductor, wherein a gate insulating film (7) is formed of a material that has a barrier against a minority carrier of an n-type body layer (3) and does not have a barrier against a minority carrier of a p-type drift layer (2). This makes i...
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Main Author | |
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Format | Patent |
Language | English French Japanese |
Published |
10.08.2017
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Subjects | |
Online Access | Get full text |
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