ORGANIC FILM COMPOSITION AND PATTERN FORMING METHOD

• Main Authors: MUN, Soohyoun, HEO, Yumi, LIM, Jaebum, KANG, Sunhae, CHOI, Yoojeong
• Format: Patent
• Language: English; French; Korean
• Published: 06.07.2017
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

The present invention relates to: an organic film composition containing a polymer, which comprises a structural unit represented by chemical formula 1, an additive represented by chemical formula 2, and a solvent; and a pattern forming method using the organic film composition. Chemical formulas 1 and 2 are the same as those defined in the description. La présente invention concerne : une composition de film organique contenant un polymère, qui comprend une unité structurelle représentée par la formule chimique 1, un additif représenté par la formule chimique 2, et un solvant ; et un procédé de formation de motif à l'aide de la composition de film organique. Les formules chimiques 1 et 2 sont identiques à celles définies dans la description. 화학식 1로 표현되는 구조단위를 포함하는 중합체, 화학식 2로 표현되는 첨가제, 그리고 용매를 포함하는 유기막 조성물, 및 상기 유기막 조성물을 사용하는 패턴형성방법에 관한 것이다. 상기 화학식 1 및 2의 정의는 명세서 내에 기재한 바와 같다.