METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS

The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sput...

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Main Authors CASAGRANDE DENARDIN, Juliano, PALMA SOLORZA, Juan Luis, ESCRIG MURUA, Juan Eduardo
Format Patent
LanguageEnglish
French
Spanish
Published 18.05.2017
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Abstract The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sputtering, which film can be used as a magnetic field sensor, and a metal nanomodulated stencil are analysed. La presente invención se refiere a un método de nanomodulación de películas metálicas mediante pulverización catódica de metales en alto vacío y plantillas de Al anodizado. Como ejemplo de uso de estas películas metálicas nanomoduladas, se analiza la síntesis u obtención de una película magnéticamente blanda mediante pulverización catódica - que puede ser usada como sensor de campo magnético, y una plantilla nanomodulada metálica. La présente invention concerne un procédé de nanomodulation de pellicules métalliques à l'aide d'une pulvérisation cathodique de métaux sous vide poussé et de modèles d'Al anodisé. Comme exemple d'utilisation de ces pellicules métalliques nanomodulées, on étudie la synthèse ou l'obtention d'une pellicule à caractère magnétique doux à l'aide d'une pulvérisation cathodique - qui pourrait être utilisée comme capteur de champ magnétique, et d'un modèle nanomodulé métallique.
AbstractList The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sputtering, which film can be used as a magnetic field sensor, and a metal nanomodulated stencil are analysed. La presente invención se refiere a un método de nanomodulación de películas metálicas mediante pulverización catódica de metales en alto vacío y plantillas de Al anodizado. Como ejemplo de uso de estas películas metálicas nanomoduladas, se analiza la síntesis u obtención de una película magnéticamente blanda mediante pulverización catódica - que puede ser usada como sensor de campo magnético, y una plantilla nanomodulada metálica. La présente invention concerne un procédé de nanomodulation de pellicules métalliques à l'aide d'une pulvérisation cathodique de métaux sous vide poussé et de modèles d'Al anodisé. Comme exemple d'utilisation de ces pellicules métalliques nanomodulées, on étudie la synthèse ou l'obtention d'une pellicule à caractère magnétique doux à l'aide d'une pulvérisation cathodique - qui pourrait être utilisée comme capteur de champ magnétique, et d'un modèle nanomodulé métallique.
Author ESCRIG MURUA, Juan Eduardo
CASAGRANDE DENARDIN, Juliano
PALMA SOLORZA, Juan Luis
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DocumentTitleAlternate MÉTODO DE NANOMODULACIÓN DE PELÍCULAS METÁLICAS MEDIANTE PULVERIZACIÓN CATÓDICA DE METALES EN ALTO VACÍO Y PLANTILLAS
PROCÉDÉ DE NANOMODULATION DE PELLICULES MÉTALLIQUES À L'AIDE D'UNE PULVÉRISATION CATHODIQUE DE MÉTAUX SOUS VIDE POUSSÉ ET DE MODÈLES
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Snippet The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al....
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS THEREFOR
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
PERFORMING OPERATIONS
PHYSICS
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
Title METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS
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