METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS
The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sput...
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Language | English French Spanish |
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18.05.2017
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Abstract | The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sputtering, which film can be used as a magnetic field sensor, and a metal nanomodulated stencil are analysed.
La presente invención se refiere a un método de nanomodulación de películas metálicas mediante pulverización catódica de metales en alto vacío y plantillas de Al anodizado. Como ejemplo de uso de estas películas metálicas nanomoduladas, se analiza la síntesis u obtención de una película magnéticamente blanda mediante pulverización catódica - que puede ser usada como sensor de campo magnético, y una plantilla nanomodulada metálica.
La présente invention concerne un procédé de nanomodulation de pellicules métalliques à l'aide d'une pulvérisation cathodique de métaux sous vide poussé et de modèles d'Al anodisé. Comme exemple d'utilisation de ces pellicules métalliques nanomodulées, on étudie la synthèse ou l'obtention d'une pellicule à caractère magnétique doux à l'aide d'une pulvérisation cathodique - qui pourrait être utilisée comme capteur de champ magnétique, et d'un modèle nanomodulé métallique. |
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AbstractList | The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al. As an example of the use of these nanomodulated metal films, the synthesis or production of a magnetically weak film by means of cathode sputtering, which film can be used as a magnetic field sensor, and a metal nanomodulated stencil are analysed.
La presente invención se refiere a un método de nanomodulación de películas metálicas mediante pulverización catódica de metales en alto vacío y plantillas de Al anodizado. Como ejemplo de uso de estas películas metálicas nanomoduladas, se analiza la síntesis u obtención de una película magnéticamente blanda mediante pulverización catódica - que puede ser usada como sensor de campo magnético, y una plantilla nanomodulada metálica.
La présente invention concerne un procédé de nanomodulation de pellicules métalliques à l'aide d'une pulvérisation cathodique de métaux sous vide poussé et de modèles d'Al anodisé. Comme exemple d'utilisation de ces pellicules métalliques nanomodulées, on étudie la synthèse ou l'obtention d'une pellicule à caractère magnétique doux à l'aide d'une pulvérisation cathodique - qui pourrait être utilisée comme capteur de champ magnétique, et d'un modèle nanomodulé métallique. |
Author | ESCRIG MURUA, Juan Eduardo CASAGRANDE DENARDIN, Juliano PALMA SOLORZA, Juan Luis |
Author_xml | – fullname: CASAGRANDE DENARDIN, Juliano – fullname: PALMA SOLORZA, Juan Luis – fullname: ESCRIG MURUA, Juan Eduardo |
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DocumentTitleAlternate | MÉTODO DE NANOMODULACIÓN DE PELÍCULAS METÁLICAS MEDIANTE PULVERIZACIÓN CATÓDICA DE METALES EN ALTO VACÍO Y PLANTILLAS PROCÉDÉ DE NANOMODULATION DE PELLICULES MÉTALLIQUES À L'AIDE D'UNE PULVÉRISATION CATHODIQUE DE MÉTAUX SOUS VIDE POUSSÉ ET DE MODÈLES |
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Notes | Application Number: WO2016CL50059 |
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Snippet | The present invention relates to a method for nanomodulating metal films by means of high-vacuum cathode sputtering of metals, and to stencils of anodised Al.... |
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SubjectTerms | APPARATUS THEREFOR CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS PHYSICS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
Title | METHOD FOR NANOMODULATING METAL FILMS BY MEANS OF HIGH-VACUUM CATHODE SPUTTERING OF METALS AND STENCILS |
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