FILM FORMATION METHOD

• Main Authors: JIANG, YOUSONG, SHIONO, ICHIRO, MIYAUCHI, MITSUHIRO, SAMORI, SHINGO
• Format: Patent
• Language: English; French; Japanese
• Published: 04.12.2014
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GLASS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided is a film formation method, whereby it becomes possible to form a stain-proof film having high durability on the surface of a chemically strengthened glass substrate without additionally requiring the formation of an alkaline barrier layer or the washing with an acid. A film formation method comprising: introducing an argon gas and an oxygen gas into an ion source (38) at a predetermined flow volume ratio to generate an ion beam that contains an argon gas ion and an oxygen gas ion at a specified ratio; preliminarily irradiating a substrate (14) comprising a chemically strengthened glass with the ion beam; and then forming a stain-proof film on the preliminarily irradiated surface directly in a resistive heating mode. L'invention concerne un procédé de formation de film, par lequel il devient possible de former un film résistant aux salissures ayant une durabilité élevée, sur la surface d'un substrat vitreux chimiquement renforcé sans en outre nécessiter la formation d'une couche formant barrière alcaline ou de lavage à l'aide d'un acide. Ledit procédé de formation de film comprenant : l'introduction d'un gaz argon et d'un gaz oxygène dans une source d'ions (38) sous un rapport prédéterminé des débits pour générer un faisceau d'ions qui contient un ion de gaz argon et un ion de gaz oxygène sous un rapport spécifié ; l'irradiation préliminaire d'un substrat (14) comprenant un verre chimiquement renforcé à l'aide du faisceau d'ions ; et ensuite la formation d'un film résistant aux salissures sur la surface irradiée au préalable directement selon un mode de chauffage ohmique.