SEMICONDUCTOR DEVICE

The disclosed semiconductor device is provided with a substrate, a first insulating film on the top surface of said substrate, and a second insulating film on top of said first insulating film. The first insulating film has a substrate-side first surface, a second surface on the opposite side, and s...

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Bibliographic Details
Main Authors MURAYAMA, KEIICHI, HOSOI, HIROYUKI, NAKAZAWA, KAZUSHI, MIYAJIMA, KENICHI
Format Patent
LanguageEnglish
French
Japanese
Published 23.10.2014
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Summary:The disclosed semiconductor device is provided with a substrate, a first insulating film on the top surface of said substrate, and a second insulating film on top of said first insulating film. The first insulating film has a substrate-side first surface, a second surface on the opposite side, and side surfaces. The first insulating film has a higher coefficient of thermal expansion than the second insulating film, the second surface of the first insulating film contacts the second insulating film, and the side surfaces of the first insulating film have regions that do not contact the second insulating film. Le dispositif à semi-conducteurs de l'invention est équipé : d'un substrat; d'un premier film isolant disposé sur la face supérieure du substrat, et possédant une première face côté substrat, une seconde face opposée à la première face, et une face latérale; et d'un second film isolant disposé sur le premier film isolant. Le premier film isolant possède un coefficient de dilatation thermique supérieur à celui du second film isolant, est en contact avec le second film isolant au niveau de la seconde face, et possède une région de non contact vis-à-vis de la seconde face au niveau de la face latérale.
Bibliography:Application Number: WO2014JP00270