PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

• Main Authors: MORSE, PATRICK LAWRENCE, GERMAN, JOHN ROBERT, NEAL, MICHELLE LYNN, CROWLEY, DANIEL THEODORE, MEREDITH, JR., WILLIAM A
• Format: Patent
• Language: English; French
• Published: 03.07.2014
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed. La présente invention, selon un mode de réalisation, concerne une source de plasma comprenant un corps dans lequel une cavité est formée et au moins deux ensembles magnétrons indépendants disposés à l'intérieur de la cavité. Selon l'invention, les ensembles magnétrons sont mutuellement électriquement isolés l'un de l'autre et du corps. Selon une mise en œuvre de ce mode de réalisation, les ensembles magnétrons indépendants comprennent des ensembles magnétrons à dérive fermée. L'invention concerne également d'autres modes de réalisation.