METHANOFULLERENES

• Main Authors: YANG, DONGXU, PREECE, JON, ANDREW, MCCLELLAND, ALEXANDRA, XUE, XIANG, FROMMHOLD, ANDREAS, PALMER, RICHARD, EDWARD, ROBINSON, ALEX PHILIP, GRAHAM, ATHENSEW
• Format: Patent
• Language: English; French
• Published: 22.05.2014
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; METALLURGY; NANOTECHNOLOGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

The present disclosure relates to novel methanofullerene derivatives, negative- type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. La présente invention concerne de nouveaux dérivés de méthanofullerène, des compositions de photorésist de type négatif préparées à partir de ceux-ci et leurs procédés d'utilisation. Les dérivés, leurs compositions de photorésist et les procédés sont idéals pour le traitement à fins motifs à l'aide, par exemple, d'un rayonnement ultraviolet, d'un rayonnement au-delà des ultraviolets extrêmes, d'un rayonnement ultraviolet extrême, de rayons X et de rayons de particules chargées.