TRANSPARENT VAPOR-DEPOSITED FILM

• Main Authors: MATSUI, SHIGEKI, MIYAMA, HIROSHI, ASUMA, TATSUO, MATSUZAKI, HIROSHI, KOMURO, TERUHISA, MIYAZAKI, KAORU, GOTO, TAKAKAZU
• Format: Patent
• Language: English; French; Japanese
• Published: 03.04.2014
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; PERFORMING OPERATIONS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

Employed is a roller-type continuous vapor-deposited film forming device in which a film-forming section and a preprocessing section provided with a plasma preprocessing device are arranged in series at a distance from each other. With a substrate transported at a high speed, plasma (P) is supplied to the substrate surface side while set to an electrically positive potential by a plasma preprocessing means for supplying the plasma toward the substrate (S) in a space enclosed in a preprocessing roller, and enclosed in a plasma supply means for supplying a plasma-forming gas and in a magnet (21), which is a magnetism formation means. An active preprocessed surface is formed on the surface of the substrate (S). An inorganic oxide vapor-deposited film having as a principal component thereof an aluminum oxide containing AL-C covalent bonds is immediately formed at high speed in succession on the preprocessed surface of the substrate to produce a highly adhesive transparent vapor-deposited film. L'invention concerne un dispositif de formation de film déposé en phase vapeur, continu, de type rouleau, dans lequel une section de formation de film et une section de pré-traitement dotée d'un dispositif de pré-traitement au plasma, sont agencées en série à distance l'une de l'autre. Avec un substrat transporté à grande vitesse, du plasma (P) est fourni du côté de surface du substrat, en étant établi à un potentiel électrique positif par un moyen de pré-traitement au plasma, afin d'alimenter le plasma vers le substrat (S) dans un espace enserré dans un rouleau de pré-traitement et enserré dans un moyen d'alimentation de plasma pour alimenter un gaz de formation de plasma et dans un aimant (21), qui est un moyen de formation de magnétisme. Une surface pré-traitée active est formée sur la surface du substrat (S). Un film d'oxyde inorganique déposé en phase vapeur, ayant comme composant principal un oxyde d'aluminium contenant des liaisons covalentes AL-C, est formé immédiatement à grande vitesse, en succession, sur la surface pré-traitée du substrat, afin de produire un film hautement adhésif, transparent, déposé en phase vapeur.