LIQUID COMPOSITION FOR CLEANING, METHOD FOR CLEANING SEMICONDUCTOR ELEMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

• Main Authors: SHIMADA KENJI, YOSHIDA HIROSHI, OHTO MASARU, ABE KOJIRO
• Format: Patent
• Language: English; French; Japanese
• Published: 19.12.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

[Problem] The purpose of the present invention is to provide: a liquid composition for cleaning, which removes an organosiloxane thin film, a dry etching residue and a photoresist on the surface of an object to be processed in the production procedure of a semiconductor element, while suppressing da...