LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

A lithographic apparatus having two substrate tables (WTa, WTb) or two support structures for patterning devices that are positioned by planar motors acting against a magnet plate (13) has one or more balance masses (11, 12) also driven against the magnet plate so as to minimize movement of the magn...

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Bibliographic Details
Main Authors VAN DRENT, WILLIAM, PETER, VERVOORDELDONK, MICHAEL, JOHANNES
Format Patent
LanguageEnglish
French
Published 06.02.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus having two substrate tables (WTa, WTb) or two support structures for patterning devices that are positioned by planar motors acting against a magnet plate (13) has one or more balance masses (11, 12) also driven against the magnet plate so as to minimize movement of the magnet plate. Thereby, non-repeating positioning errors related to variations in the position of the magnet plate are reduced. La présente invention concerne un appareil lithographique présentant deux tables de substrat ou deux structures de support pour dispositifs de reproduction qui sont positionnés par des moteurs plans agissant contre une plaque d'aimant, ledit appareil lithographique présentant une ou plusieurs masses d'équilibre également entraînées contre la plaque d'aimant de façon à réduire à un minimum le mouvement de la plaque d'aimant. Ainsi, des erreurs de positionnement non répétitives liées aux variations de la position de la plaque d'aimant sont réduites.
Bibliography:Application Number: WO2013EP61781