PATTERNED ROLL AND MANUFACTURING METHOD THEREFOR

• Main Authors: SUGAWARA, SHINTARO, SHIGETA, TATSUO, SHIGETA, KAKU
• Format: Patent
• Language: English; French; Japanese
• Published: 28.11.2013
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTROGRAPHY; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LINING MACHINES; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM; PRINTING; PRINTING PLATES OR FOILS; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES; STAMPS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TYPEWRITERS

Provided is a patterned roll, which eliminates the problem of side etching and which has excellent chemical resistance and release properties, and a manufacturing method therefor. The patterned roll is obtained by: coating a photosensitive material on the surface of a base material and exposing/developing to form a resist pattern; forming a first DLC coating film on the surface of the base material and the resist pattern; peeling off the first DLC coating film formed on the resist pattern together with the resist pattern to form a DLC pattern on the surface of the base material; and forming a second DLC coating film on the surface of the base material and the DLC pattern. L'invention porte sur un rouleau à motifs, lequel rouleau élimine le problème de gravure latérale, et lequel a d'excellentes propriétés de résistance chimique et de libération, et sur son procédé de fabrication. Le rouleau à motifs est obtenu par : revêtement d'un matériau photosensible sur la surface d'un matériau de base et exposition/développement de façon à former un motif de réserve ; formation d'un premier film de revêtement du type diamant sur la surface du matériau de base et le motif de réserve ; arrachage du premier film de revêtement du type diamant formé sur le motif de réserve avec le motif de réserve de façon à former un motif de revêtement du type diamant sur la surface du matériau de base ; et formation d'un second film de revêtement du type diamant sur la surface du matériau de base et le motif de revêtement du type diamant.