THERMAL PROCESSING CHAMBER WITH TOP SUBSTRATE SUPPORT ASSEMBLY

• Main Authors: HUNTER, AARON MUIR, SEREBRYANOV, OLEG, RANISH, JOSEPH M
• Format: Patent
• Language: English; French
• Published: 01.08.2013
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FURNACES; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; HEATING; KILNS; LIGHTING; MECHANICAL ENGINEERING; OPEN SINTERING OR LIKE APPARATUS; OVENS; RETORTS; SEMICONDUCTOR DEVICES; WEAPONS

Embodiments of the present invention provide thermal processing chambers including a drive mechanism and a heating assembly disposed on opposite sides of a substrate support assembly. Particularly, the heating assembly is disposed below the substrate support assembly to process a substrate with a device side facing up and the drive mechanism is disposed above the substrate assembly. Les modes de réalisation de la présente invention concernent des chambres de traitement thermique comprenant un mécanisme d'entraînement et un ensemble de chauffage disposé sur des côtés opposés d'un ensemble de support de substrat. En particulier, l'ensemble de chauffage est disposé au-dessous de l'ensemble support de substrat pour traiter un substrat avec un dispositif côté tourné vers le haut et le mécanisme d'entraînement disposé au-dessus de l'ensemble de substrat.