APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND RECODING MEDIUM

• Main Authors: WADA YUICHI, SAKUMA HARUNOBU, TATENO HIDETO, ASHIHARA HIROSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 30.05.2013
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

This apparatus for manufacturing semiconductor devices is provided with a processing liquid supply part for supplying processing liquid into a processing chamber which houses a substrate, a heater part for heating the processing liquid in the processing chamber, and a substrate support part which is provided in the processing chamber and supports the substrate. L'invention concerne un appareil de fabrication de dispositifs semi-conducteurs comprenant une partie d'alimentation en liquide de traitement pour introduire un liquide de traitement dans une chambre de traitement qui contient un substrat, une partie de chauffage pour chauffer le liquide de traitement dans la chambre de traitement, et une partie de support de substrat disposée dans la chambre de traitement pour soutenir le substrat.