POLYSILOXAZANE HYDROXIDE THIN-FILM RINSE SOLUTION, AND POLYSILOXAZANE HYDROXIDE THIN-FILM PATTERN-FORMING METHOD USING SAME

Provided is a polysiloxazane hydroxide thin-film rinse solution comprising, with respect to the rinse solution as a whole, between 0.01 wt.% and 7 wt.% of an additive selected from the group consisting of alcohol-based solvents, ester-based solvents, silanol-based solvents, alkoxysilane-based solven...

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Main Authors KIM, SANG-KYUN, LEE, JIN-WOOK, YUN, HUIAN, KIM, BONG-HWAN, BAE, JIN-HEE, LIM, SANG-HAK, KWAK, TAEK-SOO
Format Patent
LanguageEnglish
French
Korean
Published 16.05.2013
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Summary:Provided is a polysiloxazane hydroxide thin-film rinse solution comprising, with respect to the rinse solution as a whole, between 0.01 wt.% and 7 wt.% of an additive selected from the group consisting of alcohol-based solvents, ester-based solvents, silanol-based solvents, alkoxysilane-based solvents and alkyl silazane based solvents and combinations thereof. Solution de rinçage formant film mince d'hydroxyde de polysiloxazane comprenant, par rapport à la solution de rinçage dans son ensemble, entre 0,01 et 7 % en poids d'un additif choisi dans le groupe constitué par les solvants à base d'alcools, les solvants à base d'esters, les solvants à base de silanols, les solvants à base d'alcoxysilanes et les solvants à base d'alkylsilazanes et leurs combinaisons.
Bibliography:Application Number: WO2012KR09044