PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE, PRODUCTION DEVICE FOR SEMICONDUCTOR DEVICE, AND STORAGE MEDIUM

• Main Authors: WADA YUICHI, SAKUMA HARUNOBU, TATENO HIDETO, AMANO TOMIHIRO, HIYAMA SHIN, ASHIHARA HIROSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 10.05.2013
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention comprises the following steps: a step for accommodating inside of a processing chamber a substrate in which a silicon-containing film has been formed; a step for providing gas to the inside of the processing chamber from a gas providing unit, and for making the pressure in the...