RESIN COMPOSITION, AND FILM FORMATION METHOD USING SAME

• Main Authors: SHIMIZU, TAKAFUMI, ERIYAMA, YUUICHI, FUJITOMI, SHINTAROU, MIYAKI, NOBUYUKI
• Format: Patent
• Language: English; French; Japanese
• Published: 04.04.2013
• Subjects: ADHESIVES; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; GENERAL PROCESSES OF COMPOUNDING; INKS; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS; WORKING-UP

Provided is a resin composition that contains a structural unit represented by formula (2), a polyimide precursor which has a structural unit represented by formula (1), and a solvent mainly comprising a non-amide-based solvent. (In formula (1), the R groups are each independently a hydrogen atom or a monovalent organic group, the R1 groups are each independently a divalent organic group, the R2 groups are each independently a tetravalent organic group, and n is a positive integer. However, at least either of R1 and R2 contains a halogen atom or a haloalkyl group.) (In formula (2), the plurality of R5 groups are each independently a monovalent organic group having 1 to 20 carbon atoms, and m is an integer between 3 and 200.) L'invention concerne une composition de résine qui contient une unité structurale représentée par la formule (2), un précurseur de polyimide qui possède une unité structurale représentée par la formule (1) et un solvant comportant principalement un solvant non à base d'amide. (Dans la formule (1), les groupes R représentent chacun indépendamment un atome d'hydrogène ou un groupe organique monovalent, les groupes R1 représentent chacun indépendamment un groupe organique divalent, les groupes R2 représentent chacun indépendamment un groupe organique tétravalent et n est un entier positif. Cependant, au moins l'un parmi R1 et R2 contient un atome d'halogène ou un groupe haloalkyle.) (Dans la formule (2), les différents groupes R5 représentent chacun indépendamment un groupe organique monovalent ayant 1 à 20 atomes de carbone et m est un entier entre 3 et 200.)