HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED

• Main Authors: UTLAUT, MARK, W, MCGINN, JAMES, B, WELLS, ANDREW, B, PARKER, N., WILLIAM, KELLOGG, SEAN
• Format: Patent
• Language: English; French
• Published: 20.06.2013
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a c...