HIGH VOLTAGE ISOLATION OF AN INDUCTIVELY COUPLED PLASMA ION SOURCE WITH A LIQUID THAT IS NOT ACTIVELY PUMPED

An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a c...

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Bibliographic Details
Main Authors UTLAUT, MARK, W, MCGINN, JAMES, B, WELLS, ANDREW, B, PARKER, N., WILLIAM, KELLOGG, SEAN
Format Patent
LanguageEnglish
French
Published 20.06.2013
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:An inductively-coupled plasma source for a focused charged particle beam system includes a plasma chamber and a fluid that is not actively pumped surrounding the plasma chamber for providing high voltage isolation between the plasma chamber and nearby parts which are at ground potential, such as a conductive shield. One or more cooling devices cool the plasma chamber by using evaporative cooling and heat pipes to dissipate the heat from the plasma chamber into a surrounding environment. L'invention concerne une source de plasma à couplage inductif pour un système à faisceau focalisé de particules chargées, comprenant une chambre à plasma ainsi qu'un fluide pompé de manière non active et entourant la chambre à plasma pour fournir une isolation haute tension entre la chambre à plasma et des pièces situées à proximité, qui sont au potentiel de la terre, telles qu'un écran conducteur. Un ou plusieurs dispositifs de refroidissement refroidissent la chambre à plasma par refroidissement par évaporation et chauffent des tuyaux afin de dissiper la chaleur de la chambre à plasma dans un milieu environnant.
Bibliography:Application Number: WO2012US43563