PASSIVATED UPSTANDING NANOSTRUCTURES AND METHODS OF MAKING THE SAME
Described herein is a device comprising: a substrate; one or more of a nanostructure extending essentially perpendicularly from the substrate; wherein the nanostructure comprises a core of a doped semiconductor, an first layer disposed on the core, and a second layer of an opposite type from the cor...
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Main Authors | , |
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Format | Patent |
Language | English French |
Published |
29.11.2012
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Subjects | |
Online Access | Get full text |
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Summary: | Described herein is a device comprising: a substrate; one or more of a nanostructure extending essentially perpendicularly from the substrate; wherein the nanostructure comprises a core of a doped semiconductor, an first layer disposed on the core, and a second layer of an opposite type from the core and disposed on the first layer.
L'invention concerne un dispositif qui comporte : un substrat ; une ou plusieurs nanostructures dirigées essentiellement perpendiculairement au substrat, la nanostructure comportant un coeur d'un semi-conducteur dopé, une première couche disposée sur le coeur et une seconde couche d'un type opposé au coeur et disposée sur la première couche. |
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Bibliography: | Application Number: WO2012US20608 |