SILICA-COATING-FORMING COMPOSITION FOR USE WITH INKJETS, METHOD FOR FORMING SILICA COATING, SEMICONDUCTOR DEVICE, AND SOLAR-CELL SYSTEM
The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4-n (R1 representing a C1-20 organic group, X repr...
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Format | Patent |
Language | English French Japanese |
Published |
26.10.2012
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Abstract | The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4-n (R1 representing a C1-20 organic group, X representing a hydrolyzable group, and n representing an integer from 0 to 2); solvents including gamma-butyrolactone, a second solvent having a boiling point of 80°C to 100°C, and a third solvent having a boiling point of 180°C to 230°C; and a surface conditioner. Gamma-butyrolactone constitutes at least 20% of the total mass of the solvents, and the second solvent constitutes 20% to 50% of the total mass of the solvents.
L'invention concerne une composition de formation de film à base de silice pour jet d'encre qui comprend : un composé silicium obtenu par hydrolyse/polycondensation d'un composé représenté par la formule générale R1 nSiX4-n; un solvant; et un régulateur de surface. Le solvant contient un ?-butyrolactone, un second solvant dont le point d'ébullition se situe entre 80 et 100°C, et un troisième solvant dont le point d'ébullition se situe entre 180 et 230°C. Pour la masse totale de solvant, le rapport de masse du ?-butyrolactone est supérieur ou égal à 0,2, et le rapport de masse du second solvant se situe entre 0,2 et 0,5. Dans la formule, R1 représente un groupe organique de 1 à 20 atomes de carbones, X représente un groupe hydrolysable, et n représente un entier de 0 à 2. |
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AbstractList | The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4-n (R1 representing a C1-20 organic group, X representing a hydrolyzable group, and n representing an integer from 0 to 2); solvents including gamma-butyrolactone, a second solvent having a boiling point of 80°C to 100°C, and a third solvent having a boiling point of 180°C to 230°C; and a surface conditioner. Gamma-butyrolactone constitutes at least 20% of the total mass of the solvents, and the second solvent constitutes 20% to 50% of the total mass of the solvents.
L'invention concerne une composition de formation de film à base de silice pour jet d'encre qui comprend : un composé silicium obtenu par hydrolyse/polycondensation d'un composé représenté par la formule générale R1 nSiX4-n; un solvant; et un régulateur de surface. Le solvant contient un ?-butyrolactone, un second solvant dont le point d'ébullition se situe entre 80 et 100°C, et un troisième solvant dont le point d'ébullition se situe entre 180 et 230°C. Pour la masse totale de solvant, le rapport de masse du ?-butyrolactone est supérieur ou égal à 0,2, et le rapport de masse du second solvant se situe entre 0,2 et 0,5. Dans la formule, R1 représente un groupe organique de 1 à 20 atomes de carbones, X représente un groupe hydrolysable, et n représente un entier de 0 à 2. |
Author | YOSHIKAWA TAKAHIRO NOBE SHIGERU OKADA YUUHEI |
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DocumentTitleAlternate | COMPOSITION DE FORMATION DE FILM À BASE DE SILICE POUR JET D'ENCRE, PROCÉDÉ DE FORMATION DE FILM À BASE DE SILICE, DISPOSITIF À SEMI-CONDUCTEURS, ET SYSTÈME DE CELLULES SOLAIRES |
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RelatedCompanies | HITACHI CHEMICAL COMPANY, LTD YOSHIKAWA TAKAHIRO NOBE SHIGERU OKADA YUUHEI |
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Snippet | The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound... |
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SubjectTerms | ADHESIVES BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COLOUR PRINTING CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING PASTES GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS INKS LINING MACHINES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PERFORMING OPERATIONS POLISHES PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION SEMICONDUCTOR DEVICES STAMPS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE TRANSPORTING TYPEWRITERS USE OF MATERIALS THEREFOR WOODSTAINS |
Title | SILICA-COATING-FORMING COMPOSITION FOR USE WITH INKJETS, METHOD FOR FORMING SILICA COATING, SEMICONDUCTOR DEVICE, AND SOLAR-CELL SYSTEM |
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