SILICA-COATING-FORMING COMPOSITION FOR USE WITH INKJETS, METHOD FOR FORMING SILICA COATING, SEMICONDUCTOR DEVICE, AND SOLAR-CELL SYSTEM

• Main Authors: NOBE SHIGERU, YOSHIKAWA TAKAHIRO, OKADA YUUHEI
• Format: Patent
• Language: English; French; Japanese
• Published: 26.10.2012
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COLOUR PRINTING; CORRECTING FLUIDS; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FILLING PASTES; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; INKS; LINING MACHINES; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PERFORMING OPERATIONS; POLISHES; PRINTING; PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGYGENERATION, TRANSMISSION OR DISTRIBUTION; SEMICONDUCTOR DEVICES; STAMPS; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE; TRANSPORTING; TYPEWRITERS; USE OF MATERIALS THEREFOR; WOODSTAINS

The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4-n (R1 representing a C1-20 organic group, X representing a hydrolyzable group, and n representing an integer from 0 to 2); solvents including gamma-butyrolactone, a second solvent having a boiling point of 80°C to 100°C, and a third solvent having a boiling point of 180°C to 230°C; and a surface conditioner. Gamma-butyrolactone constitutes at least 20% of the total mass of the solvents, and the second solvent constitutes 20% to 50% of the total mass of the solvents. L'invention concerne une composition de formation de film à base de silice pour jet d'encre qui comprend : un composé silicium obtenu par hydrolyse/polycondensation d'un composé représenté par la formule générale R1 nSiX4-n; un solvant; et un régulateur de surface. Le solvant contient un ?-butyrolactone, un second solvant dont le point d'ébullition se situe entre 80 et 100°C, et un troisième solvant dont le point d'ébullition se situe entre 180 et 230°C. Pour la masse totale de solvant, le rapport de masse du ?-butyrolactone est supérieur ou égal à 0,2, et le rapport de masse du second solvant se situe entre 0,2 et 0,5. Dans la formule, R1 représente un groupe organique de 1 à 20 atomes de carbones, X représente un groupe hydrolysable, et n représente un entier de 0 à 2.