SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME
An N-type well (NW) is formed to a predetermined depth from the principal surface in a semiconductor substrate (SUB), and a P-type well (PW) and an N-type drain region (ND) are formed in the N-type well. An N-type source region (NS), an N+-type source region (NNS), and a P+-type impurity region (BCR...
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Main Author | |
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Format | Patent |
Language | English French Japanese |
Published |
25.07.2013
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Subjects | |
Online Access | Get full text |
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