SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME

An N-type well (NW) is formed to a predetermined depth from the principal surface in a semiconductor substrate (SUB), and a P-type well (PW) and an N-type drain region (ND) are formed in the N-type well. An N-type source region (NS), an N+-type source region (NNS), and a P+-type impurity region (BCR...

Full description

Saved in:
Bibliographic Details
Main Author KUBO, SHUNJI
Format Patent
LanguageEnglish
French
Japanese
Published 25.07.2013
Subjects
Online AccessGet full text

Cover

Loading…