METHOD FOR RECYCLING SPENT CMP PAD CONDITIONER AND CMP PAD RECYCLED THEREBY

• Main Authors: LEE, SEH KWANG, KIM, YOUN CHUL, LEE, JOO HAN
• Format: Patent
• Language: English; French; Korean
• Published: 27.12.2012
• Subjects: BASIC ELECTRIC ELEMENTS; DRESSING OR CONDITIONING OF ABRADING SURFACES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; SEMICONDUCTOR DEVICES; TRANSPORTING

The present invention relates to a CMP pad conditioner, and more particularly, to a method for recycling a spent CMP pad conditioner and a CMP pad conditioner recycled by the method for recycling for saving resources by recycling the spent CMP pad conditioner, which becomes spent when a diamond layer, which is coated on the surface of a CMP pad conditioner substrate having a protruding pattern, is worn down. La présente invention concerne un conditionneur de tissus de polissage CMP, et plus particulièrement un procédé de recyclage d'un conditionneur de tissus de polissage CMP usé et un conditionneur de tissus de polissage CMP recyclé par ce procédé de recyclage. L'invention permet d'économiser des ressources par recyclage du conditionneur de tissus de polissage CMP usé, lequel est usé lorsqu'une couche de diamant appliquée sur la surface d'un substrat de conditionneur de tissus de polissage CMP à motif en relief est usée.