SUBSTRATE HAVING ETCHING MASK AND METHOD FOR PRODUCING SAME

• Main Authors: SUGAWARA, SHINTARO, SHIGETA, TATSUO, SHIGETA, KAKU
• Format: Patent
• Language: English; French; Japanese
• Published: 16.08.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; HOLOGRAPHY; LINING MACHINES; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING,INKING, DAMPING, OR THE LIKE; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM; PRINTED CIRCUITS; PRINTING; PRINTING PLATES OR FOILS; PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES; SEMICONDUCTOR DEVICES; STAMPS; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION; TECHNICAL SUBJECTS COVERED BY FORMER USPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS; TRANSPORTING; TYPEWRITERS

Provided are: a substrate that has an etching mask and that is capable of high definition patterning; and a method for producing the substrate. A photosensitive material is applied onto the surface of the substrate and subjected to exposure/development to form a resist pattern, a DLC coating film is formed on the surface of the substrate and resist pattern, the DLC coating film formed on the resist pattern is delaminated together with the resist pattern, and thus a DLC pattern is formed on the surface of the substrate. La présente invention concerne : un substrat qui a un masque de gravure et qui est capable de modelage à haute définition ; et un procédé pour produire le substrat. Un matériau photosensible est appliqué sur la surface du substrat et soumis à une exposition/développement pour former un motif de réserve, un film de revêtement DLC est formé sur la surface du substrat et du motif de réserve, le film de revêtement DLC formé sur le modèle de réserve est délaminé conjointement avec le motif de réserve, et ainsi un motif DLC est formé sur la surface du substrat.