PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PERMANENT MASK RESIST, AND PROCESS FOR PRODUCTION OF PERMANENT MASK RESIST
A photosensitive resin composition comprising a polyurethane resin having an ethylenically unsaturated bond and a carboxyl group, a phosphorous-containing polyester compound, a phosphinic acid salt, and a photopolymerization initiator. La présente invention concerne une composition de résine photose...
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Format | Patent |
Language | English French Japanese |
Published |
02.08.2012
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Abstract | A photosensitive resin composition comprising a polyurethane resin having an ethylenically unsaturated bond and a carboxyl group, a phosphorous-containing polyester compound, a phosphinic acid salt, and a photopolymerization initiator.
La présente invention concerne une composition de résine photosensible comprenant une résine de polyuréthanne ayant une liaison non saturée en éthylène et un groupe carboxyle, un composé de polyester phosphoré, un sel d'acide phosphinique et un initiateur de photopolymérisation. |
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AbstractList | A photosensitive resin composition comprising a polyurethane resin having an ethylenically unsaturated bond and a carboxyl group, a phosphorous-containing polyester compound, a phosphinic acid salt, and a photopolymerization initiator.
La présente invention concerne une composition de résine photosensible comprenant une résine de polyuréthanne ayant une liaison non saturée en éthylène et un groupe carboxyle, un composé de polyester phosphoré, un sel d'acide phosphinique et un initiateur de photopolymérisation. |
Author | YOSHIDA TETSUYA OZAWA KYOUKO ITAGAKI SHUUICHI OOTOMO SATOSHI FUJII TETSUFUMI |
Author_xml | – fullname: FUJII TETSUFUMI – fullname: YOSHIDA TETSUYA – fullname: OZAWA KYOUKO – fullname: ITAGAKI SHUUICHI – fullname: OOTOMO SATOSHI |
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DocumentTitleAlternate | COMPOSITION DE RÉSINE PHOTOSENSIBLE, ÉLÉMENT PHOTOSENSIBLE, MASQUE DE RÉSERVE PERMANENT ET PROCÉDÉ DE PRODUCTION D'UN MASQUE DE RÉSERVE PERMANENT |
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RelatedCompanies | YOSHIDA TETSUYA OZAWA KYOUKO ITAGAKI SHUUICHI OOTOMO SATOSHI HITACHI CHEMICAL COMPANY, LTD FUJII TETSUFUMI |
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SubjectTerms | ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PERMANENT MASK RESIST, AND PROCESS FOR PRODUCTION OF PERMANENT MASK RESIST |
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