PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, PERMANENT MASK RESIST, AND PROCESS FOR PRODUCTION OF PERMANENT MASK RESIST

• Main Authors: FUJII TETSUFUMI, YOSHIDA TETSUYA, OZAWA KYOUKO, ITAGAKI SHUUICHI, OOTOMO SATOSHI
• Format: Patent
• Language: English; French; Japanese
• Published: 02.08.2012
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS; THEIR PREPARATION OR CHEMICAL WORKING-UP

A photosensitive resin composition comprising a polyurethane resin having an ethylenically unsaturated bond and a carboxyl group, a phosphorous-containing polyester compound, a phosphinic acid salt, and a photopolymerization initiator. La présente invention concerne une composition de résine photosensible comprenant une résine de polyuréthanne ayant une liaison non saturée en éthylène et un groupe carboxyle, un composé de polyester phosphoré, un sel d'acide phosphinique et un initiateur de photopolymérisation.