HIGH PURITY ALUMINUM COATING HARD ANODIZATION

The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. The chamber component includes a polished high purity aluminum coating and a hard anodized coating that is resistive to the plasma processing environment. L...

Full description

Saved in:
Bibliographic Details
Main Authors OUYE, ALAN HIROSHI, KOCH, RENEE MARGUERITE
Format Patent
LanguageEnglish
French
Published 14.06.2012
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. The chamber component includes a polished high purity aluminum coating and a hard anodized coating that is resistive to the plasma processing environment. L'invention concerne un composant de chambre, ou un procédé de fabrication d'un composant de chambre utilisable dans un appareil à chambre de traitement par plasma. Le composant de chambre comporte un revêtement poli à base d'aluminium très pur et un revêtement obtenu par anodisation dure qui est résistant à l'environnement de traitement par plasma.
Bibliography:Application Number: WO2011US54225