MULTI FACET MIRROR OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

• Main Authors: HAUF, MARKUS, RASSEL, THORSTEN
• Format: Patent
• Language: English; French
• Published: 01.03.2012
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A multi facet mirror (26) of a microlithographic projection exposure apparatus comprises a plurality of mirror facet units. Each unit comprises a mirror member (32) with a body (40), a reflective coating (44) provided at one end of the body (40) and an actuating surface (50) provided at an opposite...