POLYMERIZABLE COMPOSITION FOR SOLDER RESIST, AND SOLDER RESIST PATTERN FORMATION METHOD

A polymerizable composition for a solder resist, comprising an infrared ray blocking material, a polymerization initiator and a polymerizable compound; and a solder resist pattern formation method using the polymerizable composition for a solder resist. La présente invention concerne une composition...

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Bibliographic Details
Main Authors YABUKI, YOSHIHARU, ARIOKA, DAISUKE, SHIMADA, KAZUTO, IKEDA, KIMI
Format Patent
LanguageEnglish
French
Japanese
Published 04.08.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A polymerizable composition for a solder resist, comprising an infrared ray blocking material, a polymerization initiator and a polymerizable compound; and a solder resist pattern formation method using the polymerizable composition for a solder resist. La présente invention concerne une composition polymérisable pour réserve de soudure comprenant un matériau de blocage des rayons infrarouges, un initiateur de polymérisation et un composé polymérisable. La présente invention concerne également un procédé de formation d'un motif de réserve de soudure utilisant la composition polymérisable pour réserve de soudure.
Bibliography:Application Number: WO2010JP72154