SPORICIDAL COMPOSITION FOR CLOSTRIDIUM DIFFICILE SPORES

A cleaning medium or formulation that contains a sporicidal composition is described. The composition includes about 0.1-20% weight/weight of a germinant agent, about 0.01-75% w/w of an antimicrobial agent, in terms of dry or wet total weight, and which is admixed with water to generate a solution w...

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Bibliographic Details
Main Authors KOENIG, DAVID, W, HOFFMAN, DOUGLAS, R, HE, AIMIN, KIM, DAEGUN, KIM, YOUNGSOOK, SMILTNEEK, ANDREA, J
Format Patent
LanguageEnglish
French
Published 10.11.2011
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Summary:A cleaning medium or formulation that contains a sporicidal composition is described. The composition includes about 0.1-20% weight/weight of a germinant agent, about 0.01-75% w/w of an antimicrobial agent, in terms of dry or wet total weight, and which is admixed with water to generate a solution with a p H of 3.5-9.5. The composition can help trigger the germination of spores, in particular C. difficile, and subsequently deactivate or kill the spores. A means of applying the cleaning formulation in a medium and process for cleaning are also described. L'invention porte sur un milieu ou une formulation de nettoyage qui contient une composition sporicide. La composition comprend environ 0,1-20 % en poids/poids d'un agent de germination, environ 0,01-75 % p/p d'un agent antimicrobien, en termes de poids total sec ou humide, et qui sont mélangés avec de l'eau pour produire une solution ayant un pH de 3,5-9,5. La composition peut aider à déclencher la germination de spores, en particulier de C. difficile, et par la suite désactiver ou tuer les spores. L'invention porte également sur un moyen d'application de la formulation de nettoyage dans un milieu et sur un procédé de nettoyage.
Bibliography:Application Number: WO2010IB55090