PHOTORESIST COMPOSITION

Certain methanofullerene derivatives are described, having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists. L'invention porte sur certains dérivés de méthanofullerène,...

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Bibliographic Details
Main Authors ROBINSON, ALEX, PREECE, JON, ANDREW, PALMER, RICHARD
Format Patent
LanguageEnglish
French
Published 26.05.2011
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOUNDS THEREOF
ELECTROGRAPHY
HOLOGRAPHY
INORGANIC CHEMISTRY
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
METALLURGY
NANOTECHNOLOGY
NON-METALLIC ELEMENTS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TRANSPORTING
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Summary:Certain methanofullerene derivatives are described, having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists. L'invention porte sur certains dérivés de méthanofullerène, ayant des chaînes latérales comprenant des groupes protecteurs labiles en milieu acide. Les dérivés de méthanofullerène peuvent trouver une application comme matières de résine photosensible, et en particulier comme résines photosensibles positives.
Bibliography:Application Number: WO2010GB02129