ETCHANT COMPOSITION FOR FORMING METAL INTERCONNECTS

• Main Authors: YANG, SEUNG-JAE, LEE, SUCK-JUN, LEE, JOON-WOO, PARK, YOUNGUL, KWON, O-BYOUNG, LIM, MIN-KI, JANG, SANG-HOON
• Format: Patent
• Language: English; French; Korean
• Published: 03.06.2011
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NATURAL RESINS; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PAINTS; POLISHES; SEMICONDUCTOR DEVICES

The present invention provides an etchant composition for a metal film comprising at least one film selected from an indium-based transparent conductive film, an aluminum-based metal film and a titanium-based metal film, used for the interconnect of a pixel electrode, a gate electrode, a source electrode and a drain electrode. The etchant composition is excellent in etching characteristics to an indium-based transparent conductive film, an aluminum-based metal film and a titanium-based metal film, respectively, and particularly to an Al-La-based alloy film. In addition, the etchant composition can effectively etch a tri-layered film comprising an indium-based transparent conductive film, an Al-La-based alloy film and a titanium-based metal film at a time. L'invention concerne une composition d'agent de gravure destinée à un film métallique comprenant au moins un film sélectionné parmi un film conducteur transparent à base d'indium, un film métallique à base d'aluminium et un film métallique à base de titane, utilisé dans l'interconnexion d'une électrode de pixel, d'une électrode de grille, d'une électrode source et d'une électrode de drainage. La composition d'agent de gravure présente d'excellentes caractéristiques de gravure sur un film conducteur transparent à base d'indium, un film métallique à base d'aluminium et un film métallique à base de titane, respectivement, et plus particulièrement sur un film d'alliage à base d'Al-La. En outre, la composition d'agent de gravure permet de graver efficacement un film à trois couches comprenant un film conducteur transparent à base d'indium, un film d'alliage à base d'Al-La et un film métallique à base de titane en une fois.