ArF-LITHOGRAPHY MIRROR AND ArF-LITHOGRAPHY OPTICAL MEMBER

• Main Authors: OGAWA TOMONORI, IWAHASHI YASUTOMI, KOIKE AKIO
• Format: Patent
• Language: English; French; Japanese
• Published: 06.01.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; GLASS; HOLOGRAPHY; JOINING GLASS TO GLASS OR OTHER MATERIALS; MATERIALS THEREFOR; METALLURGY; MINERAL OR SLAG WOOL; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

Provided is an ArF-lithography optical member that satisfies all of the following items, (1)-(5), and the Coefficient of Thermal Expansion (CTE) thereof, at 22°C, is within a range of 0 ± 200 ppb/°C. (1): The RMS at a range, 1 mm = ? (spatial wavelength) = 10 mm, is 0.1 nm or more and 3.0 nm or less...