LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF

• Main Authors: STORET, YVAN, DOLMAZON, NELLY, TORT, FREDERIC, SANTIAGO, JOSE
• Format: Patent
• Language: English; French
• Published: 30.09.2010
• Subjects: ADDING MATERIALS TO FUELS OR FIRES TO REDUCE SMOKE ORUNDESIRABLE DEPOSITS OR TO FACILITATE SOOT REMOVAL; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; FIRELIGHTERS; FUELS; FUELS NOT OTHERWISE PROVIDED FOR; LIQUEFIED PETROLEUM GAS; LUBRICANTS; LUBRICATING COMPOSITIONS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; NATURAL GAS; ORGANIC MACROMOLECULAR COMPOUNDS; PEAT; PETROLEUM, GAS OR COKE INDUSTRIES; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BYSUBCLASSES C10G, C10K; TECHNICAL GASES CONTAINING CARBON MONOXIDE; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATINGINGREDIENTS IN A LUBRICATING COMPOSITION

The subject matter of the invention is (meth)acrylic polymers comprising a linear or branched C8, or more, fatty chain that may comprise at least one ethylenic unsaturation, which have a weight-average molecular mass (formula I) of less than 20 000 g/mol, which are free of sulphur-containing, metallic and halogenated compounds and the degree of residual monomers of which, measured by GPC, is less than or equal to 10% by mass, preferably less than or equal to 7% by mass. The subject matter of the invention is also the process for synthesizing said polymers and the use of said polymers. L'invention a pour objet des polymères (méth)acryliques à chaîne grasse linéaire ou ramifiée en C8 ou plus pouvant comporter au moins une insaturation éthylénique, de masse moléculaire moyenne en poids (formule I) inférieure à 20.000 g/mole, exempts de composés soufrés, métalliques et halogènes et dont le taux de monomères résiduels mesuré par GPC est inférieur ou égal à 10 % massique, de préférence inférieur ou égal à 7% massique. L'invention a encore pour objet le procédé de synthèse et leur utilisation.